Manufacturing Systems
memsstar’s ORBIS™ 1000 and 3000 systems provide cost-effective lab-to-fab upgrade paths from R&D through full-scale production. Seamless process transfer enables the single-wafer ORBIS 1000 platform, ideal for low-volume MEMS production environments, to be converted and upgraded to a fully automated ORBIS 3000 system. With easy integration of advanced XERIC™ (XeF2 and Vapor HF) and AURIX™ process modules, fabs can start with a single module and add additional modules to the Orbis 3000 cluster as capacity, productivity, or capability needs require.
For more information, please see our product pages and Frequently Asked Questions (FAQs) below.
FAQs: ORBIS 3000 Platform
1. What is the memsstar ORBIS 3000 platform used for?
The memsstar ORBIS 3000 is a fully automated platform offering automated wafer handling, process integration, and cluster capability for high-volume MEMS production. It supports any combination of up to three XERIC or AURIX process modules on a single system. This makes it well suited to manufacturers scaling into full production who need multiple processes integrated on one tool. As the high-volume tier of memsstar’s ORBIS platform family, it brings advanced automation and throughput to the fab floor.
2. What is the cluster capability of the ORBIS 3000?
The ORBIS 3000’s cluster capability lets manufacturers combine up to three XERIC or AURIX process modules in any combination on a single platform. This means multiple release etch and surface modification processes can be integrated together rather than run on separate stand-alone tools. Consolidating processes this way supports higher productivity and tighter process integration. It also gives fabs the flexibility to configure the platform around their specific process flow.
3. How does the ORBIS 3000 support future fab expansion?
The ORBIS 3000’s XERIC and AURIX process modules can be easily integrated into existing fabs and later supplemented with additional modules. This lets manufacturers add capability as their capacity, productivity, or process needs grow over time. The result is a scalable platform that expands alongside the business rather than requiring wholesale replacement. This future-ready design helps protect a fab’s long-term equipment investment.
4. What process performance advantages does the ORBIS 3000 deliver?
All ORBIS 3000 process modules are built on memsstar’s unique technologies for advanced process control and faster process times. These technologies produce denser, more robust films for the AURIX and faster etch rates with maximum selectivity for the XERIC, all while delivering superior within-wafer uniformity and wafer-to-wafer repeatability. Each module uses a small-volume, process-specific vacuum chamber with an optimized process kit tuned to a particular process. Together, these capabilities help ensure consistent, high-quality results across high-volume production.
5. What substrate sizes and facility requirements does the ORBIS 3000 support?
Each ORBIS 3000 process module can handle all standard substrate sizes—100mm, 125mm, 150mm, and 200mm—along with many different carrier and substrate types. The platform uses industry-standard components in a compact footprint and connects easily to existing cleanroom facilities. It also minimizes the need for ancillary equipment to handle non-toxic chemicals, simplifying fab integration. Backed by memsstar’s comprehensive equipment service, the ORBIS 3000 is designed for reliability and ease of maintenance.
FAQs: ORBIS 1000 Platform
1. What is the memsstar ORBIS 1000 platform used for?
The memsstar ORBIS 1000 single-wafer vacuum loadlock platform is designed for low-volume MEMS production environments, such as aerospace and defence, medical devices, or lab cleanrooms. Featuring fully automated processing that radically improves cycle time between wafers, ORBIS 1000 delivers optimal productivity for both commercial development and low-volume production. This makes it ideally suited for manufacturers moving beyond R&D but not yet at full-scale volume. As part of memsstar’s ORBIS platform family, ORBIS 1000 brings production-grade automation in a compact, accessible format.
2. Can ORBIS 1000 scale as production demand grows?
Yes. Once demand increases, the ORBIS 1000 platform can be converted and upgraded to a fully automated ORBIS 3000 system. Importantly, this upgrade happens without losing your original process module (PM) investment, protecting the capital you’ve already committed. This gives manufacturers a clear, low-risk path from low-volume production to full-scale, high-volume manufacturing.
3. Which process modules and substrate sizes does ORBIS 1000 support?
The ORBIS 1000 platform integrates both memsstar’s XERIC and AURIX process modules. Each process module features a compact vacuum chamber that handles all standard substrate dimensions—including 100mm, 125mm, 150mm, and 200mm wafers—as well as a wide range of alternative substrates and carriers. These process-specific chambers utilize optimized process kits engineered for distinct substrate types or designs. Additionally, each chamber integrates memsstar’s advanced process control to deliver uniform and highly repeatable results.
4. Are the process chambers customizable for specific designs?
Yes. Each ORBIS 1000 process module uses a small-volume vacuum chamber, and those chambers are process-specific—each configured with an optimized process kit for a particular substrate or design. This lets the platform match a customer’s exact process, rather than forcing a one-size-fits-all setup. Every chamber also features memsstar’s superior process control for consistent, repeatable results.
5. What are the key benefits of the ORBIS 1000’s design?
The platform delivers high reliability in a compact footprint built with industry-standard components. It connects easily to existing cleanroom facilities and minimizes the need for ancillary equipment to handle non-toxic chemicals. The platform is also designed for easy maintenance, backed by memsstar’s comprehensive equipment service. Together, these features make the ORBIS 1000 a practical, cleanroom-friendly choice for low-volume MEMS production.
