Author Archives: memsstar

Part 3: Vapour Phase Etching: A User’s Guide

Micro-Electro-Mechanical Systems (MEMS) device fabrication presents unique challenges for process engineers and their choice of equipment. This is largely due to the three-dimensional (3D) nature and electro-mechanical functioning of MEMS products. In fact, with these additional challenges, a fundamentally different …

Part 2: Material Issues in MEMS Etching Processes

MEMS device fabrication requires a broad range of reactions and chemistries to create the structures and functions of these complicated electro-mechanical systems. MEMS etching processes in particular, merit attention for material compatibilities because, of course, the function of etching is …

HF Acid Etch vs HF Vapor Etch

memsstar Recognized by Texas Instruments with 2017 Supplier Excellence Award

Single Wafer vs Batch Wafer Processing

memsstar Supports University of Edinburgh MEMS Researchers

Heterogeneous Integration Versus Dimensional Scaling; One Year In (Part 2)

SEMICON West 2016: Update from the Semiconductor Suppliers

memsstar and Plasma-Therm Partner to Strengthen MEMS Technology Offering in North America

LIVINGTON, Scotland and ST. PETERSBURG, Florida (Feb. 28, 2017) — memsstar Ltd. and Plasma-Therm LLC, both leading providers of semiconductor processing equipment for specialty markets, announced today that they have entered into a distribution agreement for North America. The agreement …

As MEMS Hits Its Stride, memsstar Is Ready