PESM 2025 is the 15th event in a series devoted to plasma etch and strip processes for micro-, nano-, and bio-technologies. This meeting will be held on June 16–17, 2025 (Monday & Tuesday) in Chemnitz, Germany.
This workshop provides a forum for open discussions between science and technology, targeting not only scientists, process engineers, and Ph.D. students but also industrial partners in the field of dry etching, including plasma processing and other vacuum-based removal techniques such as ion beam, neutral beam, and gaseous thermal etching.
PESM 2025 will focus on plasma etching and cleaning challenge for semiconductors & memory applications, for More-than-Moore applications and for quantum applications. Additionally, there are dedicated sessions on vapor cleaning, isotropic etch concepts & conditioning, as well as process diagnostics, modeling, and data Analysis. To stimulate technical discussions, invited talks will be presented by scientific and technical leaders of the etch community in each of the key areas defined above.
