26.05.2008
First Call for ENIAC proposals
30.03.2008
memsstar enters Japan market with Canon MJ
08.10.2007
Full Range of Productivity Solutions released on memsstar platform
14.07.2007
SAFC Hitech and memsstar announce Strategic Alliance
06.06.2007
Round A funding complete with Close Ventures
24.01.2007
SEMEFAB Selects memsstar® for Advanced MEMS Processing
02.01.2007
Oligon qualifies memsstar® for Advanced Release Etching on Latest MEMS Membranes
13.12.2006
Point 35 Microstructures Wins Prestigious NMI Award for Innovation
31.08.2006
MNT (Micro and Nano Technology) Project Awarded for Advanced MEMS Applications
10.07.2006
New CCFT announced at Semicon West
04.04.2006
memsstar launch SVR and SPD modules at Semicon Europa
03.02.2006
1st memsstar shipment to USA complete
06.10.2005
1st memsstar Systems Signed Off By Customer
memsstar Technology joins MEMS Industry Group
10.06.2005
POINT 35 MICROSTRUCTURES COMPLETE BOARD RE-STRUCTURING
Dry Release Etching - range of chemistries and materials
Surface Modification - robust, ultra thin coatings modules
PROCESS INTEGRATION AND UNRIVALLED PROCESS CONTROL
Sacrificial Vapour Release
memsstar SVR is unique technology using gas phase etching and advanced process controls ...
Integration
A common technique used in semiconductor fabrication is the use of cluster tools ...
Surface Preparation and Deposition
Memsstar SPD enables surface micro engineering using the latest nanotechnology material ...
